CD SEM System

KLA-Tencor Instruments generation of in-line critical dimension scanning electron microscopes (CD SEMs) has been developed that addresses the advanced monitoring challenges for lithography and etch applications that chipmakers face as they transition to the 0.13-micron node and 300-mm manufacturing. The 8200 Series (for 200-mm wafers) and 8400 Series (for 300-mm wafers) CD SEM tools combine high throughput, advanced imaging, measurement precision and enhanced productivity capabilities in a Windows NT environment.

The systems have options for a high-precision laser stage interferometer and automated recipe creation software. To meet the metrology needs for new semiconductor processes such as dual damascene interconnects, the systems incorporate Charge Equalization capability (CEq). CEq enables precise automated metrology on charge-sensitive materials that are difficult to measure with traditional CD SEM tools.

<%=company%>, 160 Rio Robles, San Jose, CA 95134. Phone: 408-875-4200; Fax: 408-571-3030.