Nanotopology Analysis System
Source: ADE Corporation
The NanoMapper metrology tool is for wafer, semiconductor equipment, and semiconductor device process development facilities, and is currently used to quantify nanotopology in development of critical lithography integrated process sequences
ADE Corporationper metrology tool is for wafer, semiconductor equipment, and semiconductor device process development facilities, and is currently used to quantify nanotopology in development of critical lithography integrated process sequences.
Nanomapper provides whole wafer topology data for 200mm and 300mm wafer sizes using advanced non-contact optical measurement to precisely quantify nanometer (nm) scale surface height variations. Tracking the phase of the optical signal using patented and proprietary ADE Phase Shift interferometric technology results in the sub-nanometer resolution of the measurement.
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